The new LFXV Series is designed for appearance inspection of large semiconductor wafers, electronic components, flat panel materials, and other large workpieces.
Typical applications include wafer scratch inspection, chip inspection on Die Attach Film (DAF), and quality inspection requiring highly uniform illumination across large inspection areas.
A live demonstration of the new LFXV Series, now supporting the inspection of larger workpieces including 12-inch wafers, is showcased.
See how the large-area flat dome light provides highly uniform illumination, making wafer defects clearly visible to the camera.

By combining the customized LFXV Series and photometric stereo methods, different defect characteristics, such as contamination or surface unevenness on glossy 3D objects, can be observed simultaneously in a single image capture.
We introduce an appearance inspection solution for highly reflective glossy parts, which have traditionally been challenging to inspect using conventional photometric stereo methods.

This demonstration introduces Two-Axis Phase Shift Light, that makes it possible to obtain an image with patterns on the surface of the workpiece removed and only uneven parts emphasized.
The imaging system projects both vertical and horizontal stripe patterns with different phase shifts onto the target by high-speed illumination switching.
Combined with a line-scan camera, it enables the inspection of moving objects while capturing uneven surface information.